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GCS History
   
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Month/Year
Milestones
8/1997
Global Communication Semiconductors, Inc. ("GCS. C") was established and set up a facility in Torrance, CA, USA.
12/1998
Successfully developed the InGaP HBT technique.
10/1999
Passed ISO 9001-2000 certification.
5/2000
Successfully developed GaAs PIN Photodiode.
4/2001
Successfully developed the high voltage InGaP HBT technique.
8/2001
Successfully developed the InP HBT technique.
12/2001
Successfully developed InGaAs PIN Photodiodes.
4/2003
Mass production of RF0.5µM pHEMT Switch.
3/2004
Successfully developed the world's fastest InP HBT technique (Ft > 300 GHz) that could be applied to optical communication 40-100G Trans-impedance Amplifier (TIA) and high-speed test equipment IC.
8/2008
Commenced GaAs concentrated photovoltaic solar battery foundry.
11/2010
Attained contracts for technology transfer from world-class silicon foundry for multiple InGaP HBT and pHEMT techniques.
11/2010
GCS Holdings, Inc., was established in the Cayman Islands.
12/2010
GCS Holdings, Inc. undertook share conversion with GCS, C.
1/2011
GCS. C became known as Global Communication Semiconductors, LLC ("GCS LLC").
2/2011
Attained R&D proposal for GaN from a major international IDM.
8/2011
Successfully transferred multiple GaAs HBT and pHEMT techniques to world-class silicon foundry company.
10/2011
Successfully certified for GaN/Si high-power RF components from a U.S. company.
2/2012
Received order from a major international IDM plant for HBT for satellite communications.
2/2013
Successfully developed high voltage InGaP HBT P7 process for the next generation of small cell base station.
2/2013
Successful certified for SiC power electric component processes from customer.
3/2013
Successfully developed wide band VCO HBT.
7/2013
Contracted with a U.S. company for GaN on SiC technology.
8/2013
Developed Super Low Noise E/D pHEMT for WLAN, GPS, DBS, and VSAT.
9/2013
Successfully developed high-gain, high-efficiency and high-linearity InGaP HBT for 802.11ac and 3G/4G handsets.
3/2014
Successfully developed high-frequency and higher-breakdown-strength 0.15μm GaN on SiC technology and HEMT technology.
9/2014
Officially listed on the Taipei Exchange.
3/2015
Successfully developed low-loss millimeter-wave monolithic mixer diode.
4/2015
Established Global Device Technologies, Co., Ltd.
6/2015
Successfully developed high-performance Bulk Acoustic Wave Resonator.
8/2015
Mass produced 25G 1310-1550nm PIN (25G 1310-1550nm InGaAs/InP PIN PD).
10/2015
Mass produced 25G 850nm GaAs PIN PD.
12/2015
Successfully developed high-speed, low-loss planar RF PIN diode.
12/2015
Completed Opto foundry process developments on 100G/400G InP-PIC and INP/Si-PIC).
3/2016
The Company's board of directors passed resolution to merge with SAIC Acquisition, Inc., a 100% owned subsidiary of San'an Optoelectronics Co., Ltd.
7/2016
Mass produced SiC JFET.
8/2016
The Company's board of directors terminates the merger agreement with San'an Optoelectronics Co., Ltd. on the merger with SAIC Acquisition, Inc.
9/2016
Begins 6-inch VCSEL wafer fab foundry service.
11/2016
Entered into joint-venture agreement with San'an Optoelectronics Co., Ltd. under which a joint-venture company Xiamen Global Advanced Semiconductor Co., Ltd., which the Company owns 49%, was established.
7/2017
GCS LLC acquires 100% shares of D-Tech Optoelectronics, Inc. in cash.
6/2018
The Company's board of directors passed resolution to acquire 2% of Xiamen Global Advanced Semiconductor Co., Ltd. from San'an Optoelectronics Co., Ltd. and increase the Company's ownership to 51%.
9/2018
Xiamen Global Advanced Semiconductor Co., Ltd. became a subsidiary of the Company.